Advances in crystal growth research
Author(s)
Bibliographic Information
Advances in crystal growth research
Elsevier, 2001
Available at 9 libraries
  Aomori
  Iwate
  Miyagi
  Akita
  Yamagata
  Fukushima
  Ibaraki
  Tochigi
  Gunma
  Saitama
  Chiba
  Tokyo
  Kanagawa
  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
  Shizuoka
  Aichi
  Mie
  Shiga
  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
  China
  Thailand
  United Kingdom
  Germany
  Switzerland
  France
  Belgium
  Netherlands
  Sweden
  Norway
  United States of America
Note
Includes bibliographical references
Description and Table of Contents
Description
The aim of this book is to provide a timely collection that highlights advances in current research of crystal growth ranging from fundamental aspects to current applications involving a wide range of materials. This book is published on the basis of lecture texts of the 11th International Summer School on Crystal Growth (ISSCG-11) to be held at Doshisha Retreat Center in Shiga Prefecture Japan, on July 24-29, 2001. This school is always associated with the International Conference of Crystal Growth (ICCG) series that have been held every three years since 1973; thus this school continues the tradition of the past 10 schools of crystal growth.
Table of Contents
Preface. Acknowledgements.1. Crystal growth - its significance for modern science and technology and its possible future applications (I. Sunagawa).Part 1. Understanding of fundamental aspects in crystal growth2. Fundamentals of phase field theory (R.F. Sekerka).3. Generic mechanism of heterogeneous nucleation and molecular interfacial effects (X.Y. Liu).4. Challenges in crystal growth science and the microgravity tool (A.A. Chernov).5. Surface step dynamics: basic concepts, theory and simulation (M. Uwaha).6. Surface step dynamics: experimental observations (J.J. Metois)7. Elementary growth process in semiconductor epitaxy - Molecular beam epitaxy as an example of epitaxy - (T. Nishinaga).8. Atomistic simulation of epitaxial growth processes (T.Ito).Part 2. Materials design and functionality of advanced materials9. Si bulk crystal growth: What and how? (K. Kakimoto).10.Optimization of melt growth processes by experimental analysis and compyter modeling (G. Muller, B. Fischer).11. Epitaxial lateral overgrowth in GaN (A. Usui, A. Sakai).12. Effects of buffer layer and advanced technologies on heroepitaxy of GaN (K. Hiramatsu).13. Self-assembled quantum dots systems: the case of GaN (B. Daudin).14. Self-organised growth of silicon nanocrystal in nanocrystalline Si/SiO2 superlattices (L. Tsybeskov, D.J. Lockwood).15. Growth and characterization of semiconductor silicon carbidge for electronic and optoelectron applications: an industrial perspective (H. McD. Hobgood, et al.). 16. Epitaxial growth of semiconductor silicon carbide: Fundamentals (H. Matsunami, T. Kimoto).17. Crystal growth and characterization of magnetic semiconductors (K. Sato).18. X-ray characterization of epitaxial layers (Y. Takeda, M. Tabuchi).19. Principles and applications of optical crystals: their stoichiometry study (S. Miyazawa).Part 3. Dynamics of crystal-liquid interface20. Surface X-ray diffraction studies of crystal growth (E. Vlieg, M. Reedijk, J. Arsic).21. Using atomic force microscopy to investigate solution crystal growth (J. J. De Yoreo, C.A. Orme, T.A. Land).22. Crystal morphology control with tailor-made additives: Astereochemical approach (I. Wiesbuch, M. Lahav, L. Leiserowitz).23. Crystal engineering of biological soft materials (K. Sato).
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