Chemical physics of thin film deposition processes for micro- and nano-technologies

Author(s)

    • NATO advanced study institute on chemical physics of thin film deposition processes for micro-and nano-technologies

Bibliographic Information

Chemical physics of thin film deposition processes for micro- and nano-technologies

edited by Yves Pauleau

(NATO science series, Sub-series II, Mathematics, physics and chemistry ; v. 55)

Kluwer Academic, c2002

  • : pb

Other Title

Proceedings of the NATO advanced study institute on chemical physics of thin film deposition processes for micro-and nano-technologies, Kaunas, Lithuania, 3-14 September, 2001

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Note

Includes index

Description and Table of Contents

Description

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Table of Contents

  • Preface. List of Participants. List of Contributors. Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems
  • T.E.G. Daenen, D.L. de Kubber. Self-Assembled Electroactive Ultrathin Films
  • T.P. Cassagneau. Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials
  • M. Konuma. Sol-Gel Deposition Processes of Thin Ceramic Films
  • D. Sporn, et al. Thin Film Deposition by Sol-Gel and CVD Processing of Metal-Organic Precursors
  • S. Mathur. Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes
  • C.R. Kleijn. Chemical Vapor Deposition of Superconductor and Oxide Films
  • G. Wahl, et al. Selective Chemical Vapor Deposition
  • J. Holleman. Photochemical Vapour Deposition of Thin Films
  • S.J.C. Irvine. Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures
  • Y. Pauleau, D. Tonneau. Proximal Probe Induced Chemical Processing for Nanodevice Elaboration
  • D. Tonneau, et al. Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms
  • C.M. Gilmore, J.A. Sprague. Deposition of Thin Films by Sputtering
  • W. Gulbinski. Mass-Transport in an Austenitic Stainless Steel under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature
  • L. Pranevicius, et al. Index.

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Details

  • NCID
    BA57112551
  • ISBN
    • 1402005245
    • 1402005253
  • Country Code
    ne
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Dordrecht
  • Pages/Volumes
    xiii, 363 p.
  • Size
    25 cm
  • Parent Bibliography ID
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