Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

Author(s)

• Swihart, M. T.
• Allendorf, Mark Donald
• Meyyappan, M.
• Electrochemical Society. High Temperature Materials Division
• Electrochemical Society. Dielectric Science and Technology Division

Bibliographic Information

Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan

（Proceedings / [Electrochemical Society], v. 2001-13）

Electrochemical Society, c2001

Note

Includes bibliographical references and indexes

Details

• NCID: BA59006533
• ISBN:
  • 1566773199
• LCCN: 2001092515
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pennington, N.J.
• Pages/Volumes: ix, 508 p.
• Size: 24 cm
• Parent Bibliography ID:
  • BA01323290