Advances in low temperature RF plasmas : basis for process design

Author(s)

• 真壁, 利明 マカベ, トシアキ

Bibliographic Information

Advances in low temperature RF plasmas : basis for process design

edited by T. Makabe

Elsevier, 2002

• : hbk

Note

Reprinted from Applied Surface Science, Vol. 192(2002) Nos. 1-4

Includes bibliographical references and index

Details

• NCID: BA60423243
• ISBN:
  • 0444510958
• Country Code: ne
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Amsterdam ; Tokyo
• Pages/Volumes: xii, 341 p.
• Size: 27 cm
• Classification:
  • DC21 : 530.442
• Subject Headings:
  • LCSH : Low temperature plasmas