Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

著者

• Dobisz, Elizabeth Ann
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

書誌事項

Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

Elizabeth A. Dobisz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3997）

SPIE, c2000

注記

Includes bibliographic references and index

• NII書誌ID(NCID): BA60711204
• ISBN:
  • 0819436151
• LCCN: 2001267776
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: xv, 900 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : Microlithography -- Industrial applications -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : X-rays -- Industrial applications -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• 親書誌ID:
  • BA0022700X