Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

著者

• Singh, Bhanwar
• Society of Photo-optical Instrumentation Engineers

書誌事項

Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

Neal T. Sullivan chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3998）

SPIE, c2000

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA60711510
• ISBN:
  • 081943616X
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: xiv, 938 p.
• 大きさ: 28 cm
• 親書誌ID:
  • BA0022700X