Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

Author(s)

• Singh, Bhanwar
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

Neal T. Sullivan chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3998）

SPIE, c2000

Note

Includes bibliographical references and index

• NCID: BA60711510
• ISBN:
  • 081943616X
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xiv, 938 p.
• Size: 28 cm
• Parent Bibliography ID:
  • BA0022700X