In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

Author(s)

• Kissinger, Gudrun
• Weiland, Larg H.
• Society of Photo-optical Instrumentation Engineers
• Scottish Enterprise
• European Optical Society
• Institution of Electrical Engineers

Bibliographic Information

In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

Gudrun Kissinger, Larg H. Weiland, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4406）

SPIE, c2001

Note

Includes bibliographic references and author index

Details

• NCID: BA61060870
• ISBN:
  • 0819441074
• LCCN: 2002277513
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: ix, 242 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874.75
  • DC21 : 621.381
• Subject Headings:
  • LCSH : Integrated circuits -- Very large scale integration -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Manufacturing processes -- Congresses
  • LCSH : Microelectronics -- Materials -- Congresses
• Parent Bibliography ID:
  • BA0022700X