2000 International Conference on Ion Implantation Technology proceedings : Ion implantation technology-2000 , Alpbach, Austria, 17-22 September 2000

著者

• International Conference on Ion Implantation Technology (2000 : Alpbach, Austria)
• Ryssel, Heiner
• Institute of Electrical and Electronics Engineers

書誌事項

2000 International Conference on Ion Implantation Technology proceedings : Ion implantation technology-2000 , Alpbach, Austria, 17-22 September 2000

editors, Heiner Ryssel ... [et al.]

IEEE Operations Center, c2000

注記

Includes bibliographical references and index

内容説明・目次

内容説明

These papers are from the International Conference on Ion Implantation Technology, 2000. They discuss: process control; safety and environment; implanted systems; ion solid interactions; emerging techniques and processes; processing and devices; annealing; and more.

目次

• Process Control
• Safety and Environment
• Implanted Systems
• Ion Solid Interactions
• Emerging Techniques & Processes
• Processing & Devices
• Annealing.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA6155621X
• ISBN:
  • 0780364627
• LCCN: 00103972
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Piscataway, NJ
• ページ数/冊数: xxvi, 829 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Ion implantation -- Congresses
  • LCSH : Semiconductor doping -- Congresses