Intergration of heterogeneous thin-film materials and devices : symposium held April 23-24, 2003, San Francisco, California, U.S.A.

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Intergration of heterogeneous thin-film materials and devices : symposium held April 23-24, 2003, San Francisco, California, U.S.A.

editors, Harry A. Atwater ... [et al.]

(Materials Research Society symposium proceedings, v. 768)

Materials Research Society, c2003

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注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

Advances in thin-film layer transfer processes have opened new routes to multimaterial integration for monolithically integrated heterogeneous components and microsystems, circumventing many of the constraints for epitaxial growth of heterogeneous materials systems. Several methods for wafer bonding and lift-off are now in use for commercial production of silicon-on-insulator wafers. As the range of materials and device complexity increases, the need grows for a fundamental understanding of mechanical, electrical and chemical processes at bonded interfaces and within the components of multimaterial laminated structures. Details of layer exfoliation and transfer mechanisms also require investigation. This book, first published in 2003, addresses the science, engineering innovations and applications of multimaterial integration. Topics range from heteroepitaxy to wafer bonding and layer transfer.

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詳細情報

  • NII書誌ID(NCID)
    BA6420732X
  • ISBN
    • 1558997059
  • LCCN
    00061633
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Warrendale, PA
  • ページ数/冊数
    ix, 131 p.
  • 大きさ
    24 cm
  • 親書誌ID
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