Epitaxy : physical principles and technical implementation

書誌事項

Epitaxy : physical principles and technical implementation

Marian A. Herman, Wolfgang Richter, Helmut Sitter

(Springer series in materials science, 62)

Springer, c2004

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注記

Includes bibliographical references (p. [467]-499) and index

内容説明・目次

内容説明

In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates, e.g. processes in which atoms of the growing film mimic the arrangement of the atoms of the substrate. Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review. A large part of this book focuses on the problems of heteroepitaxy. The most important epitaxial growth techniques which are currently widely used in basic research as well as in manufacturing processes of devices are presented and discussed in detail.

目次

  • I. Basic Concepts.- 1. Introduction.- 2. Homo- and Heteroepitaxial Crystallization Phenomena.- 3. Application Areas of Epitaxially Grown Layer Structures.- II. Technical Implementation.- 4. Solid Phase Epitaxy.- 5. Liquid Phase Epitaxy.- 6. Vapor Phase Epitaxy.- 7. Molecular Beam Epitaxy.- 8. Metal Organic Vapor Phase Epitaxy.- III. In-situ Analysis of the Growth Processes.- 9. In-situ Analysis of Species and Transport.- 10. In-situ Surface Analysis.- IV. Physics of Epitaxy.- 11. Thermodynamic Aspects.- 12. Atomistic Aspects.- 13. Quantum Mechanical Aspects.- V. Heteroepitaxy.- 14. Heteroepitaxy
  • Growth Phenomena.- 15. Material-Related Problems of Heteroepitaxy.- 16. Closing Remarks.- References.- List of Abbreviations.- List of Metalorganic Precursors.

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