Interfacial engineering for optimized properties III : symposium held April 13-15, 2004, San Francisco, California, U.S.A.

著者

    • Schuh, Christopher A.

書誌事項

Interfacial engineering for optimized properties III : symposium held April 13-15, 2004, San Francisco, California, U.S.A.

editors, Christopher A. Schuh ... [et al.]

(Materials Research Society symposium proceedings, v. 819)

Materials Research Society, c2004

タイトル別名

Interfacial engineering for optimized properties 3

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注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

This book focuses on the structure-property relationship of interfaces in materials. Rather than concentrating on a specific class of materials, it brings together a diverse group of researchers with varied interests to seek a common foundation on which to build future efforts in interfacial engineering. Both experimental and simulation contributions address the details of how interface character and the interfacial network topology in polycrystals influence mechanical properties like yield, ductility, creep and cracking resistance, as well as electronic or magnetic properties like superconductivity or ferroaelectricity. A number of contributions deal specifically with the need for more detailed understanding of the structure of individual interfaces, the statistical distribution of their character, and their connectivity in a polycrystalline structure. Topics include: the role of interfaces and deformation and fracture; chemical and environmental effects; surfaces, thin films and functional materials; structure and migration of interfaces; and interface structure, networks and correlations.

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詳細情報

  • NII書誌ID(NCID)
    BA68608694
  • ISBN
    • 1558997695
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Warrendale, Pa.
  • ページ数/冊数
    xi, 312 p.
  • 大きさ
    24 cm
  • 親書誌ID
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