Nontraditional approaches to patterning : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.

Author(s)

    • Yang, Shu

Bibliographic Information

Nontraditional approaches to patterning : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.

editors, Shu Yang ... [et al.]

(Materials Research Society symposium proceedings, v. EXS-2)

Materials Research Society, c2004

Available at  / 2 libraries

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Includes indexes

Description and Table of Contents

Description

More and more researchers are recognizing the importance of patterning materials into well-defined structures and their immediate impacts to many areas that include physics, chemistry, biology, and engineering. Compared to traditional lithographic techniques, nontraditional approaches (e.g., self-assembly, soft lithography, embossing, dip-pen lithography, scanning probe lithography and lase- induced patterning) provide avenues to explore new scientific phenomena, as well as to realize new devices in microelectronics, photonics, sensors, MEMS, and lab-on-chip systems with lower cost, higher throughput, and larger quantities. The ability to directly pattern materials in three dimensions (e.g., self-assembly, two-photon absorption and interference lithography) with tailored shape, size, and chemistry provides unparalleled control over material structures and properties. In this book, a wide range of researchers exchange views, learn about the latest advancement in materials science and engineering and develop new concepts and research directions in material patterning. Topics include: synthesis and assembly of nanostructures; soft lithography; SPM-based nanolithography; self-assembly; 3D patterning and other methods.

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Details

  • NCID
    BA68884192
  • ISBN
    • 1558997466
  • Country Code
    us
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Warrendale, Pa.
  • Pages/Volumes
    xi, 204 p.
  • Size
    23 cm
  • Parent Bibliography ID
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