Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues
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書誌事項
Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues
(Proceedings / [Electrochemical Society], v. 2002-28,
Electrochemical Society, c2003-c2004
- [I]
- II
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注記
1st: Held in Salt Lake City, Utah, October 20-24, 2004
2nd: Held in Orlando, Florida, October 12-17, 2003
Includes bibliographical references and indexes