Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues

Author(s)

• International Symposium on High Dielectric Constant Materials: Materials Science, Processing, and Reliability, and Manufacturing Issues
• Kar, Samares
• Electrochemical Society. Dielectric Science and Technology Division
• Electrochemical Society. Electronics Division

Bibliographic Information

Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues

editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics

（Proceedings / [Electrochemical Society], v. 2002-28, 2003-22）

Electrochemical Society, c2003-c2004

• [I]
• II

Note

1st: Held in Salt Lake City, Utah, October 20-24, 2004

2nd: Held in Orlando, Florida, October 12-17, 2003

Includes bibliographical references and indexes

Details

• NCID: BA69504479
• ISBN:
  • 1566773954
  • 1566774055
• LCCN: 2004100366
• LCCN: 2003109748
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pennington, NJ
• Pages/Volumes: 2 v.
• Size: 24 cm
• Classification:
  • LCC : TK7872.D53
  • DC21 : 537/.24
• Subject Headings:
  • LCSH : Dielectric devices -- Congresses
  • LCSH : Dielectrics -- Congresses
• Parent Bibliography ID:
  • BA01323290