Excimer laser technology

書誌事項

Excimer laser technology

edited by D. Basting and G. Marowsky

Springer, c2005

大学図書館所蔵 件 / 2

この図書・雑誌をさがす

注記

Includes bibliographical references and index

内容説明・目次

内容説明

A timely and comprehensive survey, Excimer Laser Technology reports on the current status and range of the underlying technology, applications and devices of this commonly used laser source, as well as the future of new technologies, such as F2 laser technology.

目次

Introductory Remarks.- Fundamentals.- Some Fundamentals of Laser Physics.- Principles of Excimer Lasers.- Design and Technology of Excimer Lasers.- High-Repetition-Rate and High-Power Lasers.- High-Energy Lasers.- Excimer Lasers for Microlithography.- Laser Beam Characterization.- Optical Coatings for Excimer Laser Applications.- Small Structures with Large Excimer Lasers.- Historical Review of Excimer Laser Development.- Applications.- Overview.- Ablation.- Micro-Machining.- Via Drilling.- Micro-Processing of Borosilicate Glass and Polymers.- F2-Laser Microfabrication for Photonics and Biophotonics.- Nano-Structuring with Femtosecond Excimer Laser Pulses.- Physical Aspects of Ultra-Fast UV Laser Transfer.- Microlithography.- TFT Annealing.- Fiber Bragg Gratings.- Marking.- Activation and Metallization of Dielectrics.- Excimer-Laser Assisted Deposition of Carbon and Boron Nitride-Based High-Temperature Superconducting Films.- Combustion Analysis.- Medical Applications of Excimer Lasers.- High-Intensity Applications of Excimer Lasers.- High-Repetition-Rate Applications of Excimer Lasers.- New Frontiers: Extreme-Ultraviolet (EUV) Technology at 13.5 nm.- Trends in Worldwide Excimer Laser Sales.

「Nielsen BookData」 より

詳細情報

  • NII書誌ID(NCID)
    BA7294129X
  • ISBN
    • 3540200568
  • LCCN
    2005923161
  • 出版国コード
    gw
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Berlin
  • ページ数/冊数
    xix, 433 p.
  • 大きさ
    24 cm
  • 分類
  • 件名
ページトップへ