Photomask fabrication technology

Author(s)

• Eynon, Benjamin G
• Wu, Banqiu

Bibliographic Information

Photomask fabrication technology

Benjamin G. Eynon, Jr., Banqiu Wu

（Electronic engineering series）

McGraw-Hill, c2005

Note

Includes bibliographical references and index

Details

• NCID: BA74317798
• ISBN:
  • 0071445633
• LCCN: 2005047886
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: New York
• Pages/Volumes: xi, 571 p.
• Size: 24 cm
• Classification:
  • LCC : TK7872.M3
  • DC22 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks
  • LCSH : Masks (Electronics)
  • LCSH : Microlithography
• Parent Bibliography ID:
  • BA14091733