Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
(Proceedings / [Electrochemical Society], v. 2005-05)
Electrochemical Society, c2005
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Includes bibliographical references and indexes