Characterization and metrology for ULSI technology 2005, Richardson, Texas 15-18 March 2005

著者

• International Conference on Characterization and Metrology for ULSI Technology (2005 : Richardson, Tex.)
• American Institute of Physics
• Seiler, David G.

書誌事項

Characterization and metrology for ULSI technology 2005, Richardson, Texas 15-18 March 2005

editors, David G. Seiler ... [et al.] ; sponsoring organizations, National Institute of Standards and Technology ... [et al.].

（AIP conference proceedings, v. 788）

American Institute of Physics, c2005

注記

Includes bibliographical references and index

内容説明・目次

内容説明

The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA75161355
• ISBN:
  • 0735402779
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Melville, N. Y.
• ページ数/冊数: xx, 667 p.
• 大きさ: 28 cm
• 付属資料: 1 CD-ROM
• 親書誌ID:
  • BA00284604