Fabrication of GaAs devices
著者
書誌事項
Fabrication of GaAs devices
（EMIS processing series / Series advisor B.L. Weiss, no. 6）
Institution of Electrical Engineers, c2005
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
This book provides fundamental and practical information on all aspects of GaAs processing and gives pragmatic advice on cleaning and passivation, wet and dry etching and photolithography. Other topics covered include device performance for HBTs (Heterojunction Bipolar Transistors) and FETs (Field Effect Transistors), how these relate to processing choices, and special processing issues such as wet oxidation, which are especially important in optoelectronic devices. This book is suitable for both new and practising engineers.
目次
Chapter 1: Introduction to GaAs devices
Chapter 2: Semiconductor properties, growth, characterisation and processing techniques
Chapter 3: Cleaning and passivation of GaAs and related alloys
Chapter 4: Wet etching and photolithography of GaAs and related alloys
Chapter 5: Dry etching of GaAs and related alloys
Chapter 6: Ohmic contacts
Chapter 7: Schottky contacts
Chapter 8: Field effect transistors
Chapter 9: Heterojunction bipolar transistors
Chapter 10: Wet oxidation for optoelectronic and MIS GaAs devices
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