Silicon heterostructure handbook : materials, fabrication, devices, circuits, and applications of SiGe and Si strained-layer epitaxy

著者

• Cressler, John D.

書誌事項

Silicon heterostructure handbook : materials, fabrication, devices, circuits, and applications of SiGe and Si strained-layer epitaxy

edited by John D. Cressler

CRC Taylor & Francis, 2006

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA76805646
• ISBN:
  • 0849335590
• LCCN: 2005041376
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Boca Raton, FL
• ページ数/冊数: xix, 1227 p.
• 大きさ: 26 cm
• 分類:
  • LCC : TK7871.96.B55
  • DC22 : 621.3815/28
• 件名:
  • LCSH : Bipolar transistors -- Handbook, manuals, etc
  • LCSH : Silicon -- Handbook, manuals, etc