{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BA76805646.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BA76805646#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BA76805646.json"},"dc:title":[{"@value":"Silicon heterostructure handbook : materials, fabrication, devices, circuits, and applications of SiGe and Si strained-layer epitaxy"}],"dc:creator":"edited by John D. Cressler","dc:publisher":[{"@value":"CRC Taylor & Francis"}],"dcterms:extent":"xix, 1227 p.","cinii:size":"26 cm","dc:language":"eng","dc:date":"2005","cinii:ncid":"BA76805646","cinii:ownerCount":"6","foaf:maker":[{"@id":"https://ci.nii.ac.jp/author/DA14250039#entity","@type":"foaf:Person","foaf:name":[{"@value":"Cressler, John D."}]}],"bibo:owner":[{"@id":"https://ci.nii.ac.jp/library/FA022084","@type":"foaf:Organization","foaf:name":"九州大学 筑紫図書館","rdfs:seeAlso":{"@id":"https://catalog.lib.kyushu-u.ac.jp/opac_openurl/?ncid=BA76805646"}},{"@id":"https://ci.nii.ac.jp/library/FA012218","@type":"foaf:Organization","foaf:name":"京都産業大学 図書館","rdfs:seeAlso":{"@id":"https://ksucat2.kyoto-su.ac.jp/webopac/ufirdi.do?ufi_target=ctlsrh&ncid=BA76805646"}},{"@id":"https://ci.nii.ac.jp/library/FA008913","@type":"foaf:Organization","foaf:name":"福岡大学 図書館","rdfs:seeAlso":{"@id":"https://fuopac.lib.fukuoka-u.ac.jp/opac/opac_openurl/?ncid=BA76805646"}},{"@id":"https://ci.nii.ac.jp/library/FA01452X","@type":"foaf:Organization","foaf:name":"奈良先端科学技術大学院大学 附属図書館","rdfs:seeAlso":{"@id":"https://library.naist.jp/opac/en/search?s_ncid=BA76805646"}},{"@id":"https://ci.nii.ac.jp/library/FA016569","@type":"foaf:Organization","foaf:name":"鹿児島工業高等専門学校 図書館","rdfs:seeAlso":{"@id":"https://libopac-c.kosen-k.go.jp/webopac54/ctlsrh.do?ncid=BA76805646"}},{"@id":"https://ci.nii.ac.jp/library/FA022211","@type":"foaf:Organization","foaf:name":"沖縄工業高等専門学校","rdfs:seeAlso":{"@id":"https://libopac-c.kosen-k.go.jp/webopac55/cattab.do"}}],"bibo:lccn":["2005041376"],"rdfs:seeAlso":[{"@id":"https://lccn.loc.gov/2005041376"}],"prism:publicationDate":["2006"],"cinii:note":["Includes bibliographical references and index"],"dc:subject":["LCC:TK7871.96.B55","DC22:621.3815/28"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Bipolar+transistors+--+Handbook%2C+manuals%2C+etc","dc:title":"Bipolar transistors -- Handbook, manuals, etc"},{"@id":"https://ci.nii.ac.jp/books/search?q=Silicon+--+Handbook%2C+manuals%2C+etc","dc:title":"Silicon -- Handbook, manuals, etc"}],"dcterms:hasPart":[{"@id":"urn:isbn:0849335590"}]}]}