Principles of physical vapor deposition of thin films

書誌事項

Principles of physical vapor deposition of thin films

K.S. Sree Harsha

Elsevier, 2006

この図書・雑誌をさがす
注記

Includes bibliographical references and index

内容説明・目次

内容説明

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

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詳細情報
  • NII書誌ID(NCID)
    BA76872166
  • ISBN
    • 008044699X
  • 出版国コード
    ne
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Amsterdam ; Tokyo
  • ページ数/冊数
    xi, 1160 p.
  • 大きさ
    25 cm
  • 分類
  • 件名
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