Principles of physical vapor deposition of thin films

Bibliographic Information

Principles of physical vapor deposition of thin films

K.S. Sree Harsha

Elsevier, 2006

Available at  / 7 libraries

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

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Details

  • NCID
    BA76872166
  • ISBN
    • 008044699X
  • Country Code
    ne
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Amsterdam ; Tokyo
  • Pages/Volumes
    xi, 1160 p.
  • Size
    25 cm
  • Classification
  • Subject Headings
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