Plasma electronics : applications in microelectronic device fabrication

著者

• 真壁, 利明 マカベ, トシアキ
• Petrović, Z. (Zoran Lj)

書誌事項

Plasma electronics : applications in microelectronic device fabrication

by T. Makabe and Z. Petrović

（Series in plasma physics）

Taylor & Francis, 2006

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts. Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.

目次

Introduction Plasma and Its Classification Application of Low-Temperature Plasma Academic Fusion References Phenomenological Description of the Charged Particle Transport Transport in Real (Configuration) Space Transport in Velocity Space Thermal Equilibrium and Its Governing Relations References Macroscopic Plasma Characteristics Introduction Quasi-Neutrality Charge-Separation in Plasmas Plasma Shielding Particle Diffusion Bohm Sheath Criterion References Elementary Processes in Gas Phase and on Surfaces Particles and Waves Collisions and Cross Sections Classical Collision Theory Quantum Theory of Scattering Collisions between Electrons and Neutral Atoms/Molecules Electron-Atom Collisions Electron-Molecule Collisions Nonconservative Collisions of Electrons with Atoms and Molecules Heavy Particle Collisions Photons in Ionized Gases Elementary Processes at Surfaces References The Boltzmann Equation and Transport Equations of Charged Particles Introduction The Boltzmann Equation Transport Coefficients The Transport Equation Collision Term in the Boltzmann Equation Boltzmann Equation for Electrons References General Properties of Charged Particle Transport in Gases Introduction Electron Transport in DC-Electric Fields Electron Transport in RF Electric Fields Ion Transport in DC-Electric Fields References Modeling of Nonequilibrium (Low-Temperature) Plasmas Introduction Continuum Models Particle Models Hybrid Models Circuit Model Electromagnetic Fields and Maxwell's Equations References Numerical Procedure of Modeling Time Constant of the System Numerical Techniques to Solve the Time-Dependent Drift-Diffusion Equation Boundary Conditions References Capacitively Coupled Plasma Radio-Frequency Capacitive Coupling Mechanism of Plasma Maintenance References Inductively Coupled Plasma Radio-Frequency Inductive Coupling Mechanism of Plasma Maintenance Wave Propagation in Plasmas References Magnetically Enhanced Plasma Direct-Current Magnetron Plasma Unbalanced Magnetron Plasma RF Magnetron Plasma Magnetic Confinements of Plasmas Magnetically Resonant Plasmas References Plasma Processing and Related Topics Introduction Physical Sputtering Plasma Chemical Vapor Deposition Plasma Etching References Index

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詳細情報

• NII書誌ID(NCID): BA76918777
• ISBN:
  • 9780750309769
• LCCN: 2005056888
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Boca Raton, FL
• ページ数/冊数: 339 p.
• 大きさ: 24 cm
• 分類:
  • LCC : TA2020
  • DC22 : 621.044
• 件名:
  • LCSH : Plasma engineering
• 親書誌ID:
  • BA76729741