Silicon micromachining
Author(s)
Bibliographic Information
Silicon micromachining
(Cambridge studies in semiconductor physics and microelectronic engineering, 7)
Cambridge University Press, 2004
- : pbk
Available at 4 libraries
  Aomori
  Iwate
  Miyagi
  Akita
  Yamagata
  Fukushima
  Ibaraki
  Tochigi
  Gunma
  Saitama
  Chiba
  Tokyo
  Kanagawa
  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
  Shizuoka
  Aichi
  Mie
  Shiga
  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
  China
  Thailand
  United Kingdom
  Germany
  Switzerland
  France
  Belgium
  Netherlands
  Sweden
  Norway
  United States of America
Note
"First paperback edition 2004"--T.p. verso
Includes bibliographical references and index
Description and Table of Contents
Description
This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).
Table of Contents
- 1. Introduction
- 2. Anisotropic wet chemical etching
- 3. Chemical physics of wet chemical etching
- 4. Waferbonding
- 5. Examples and applications
- 6. Surface micromachining
- 7. Isotropic wet chemical etching of silicon
- 8. Introduction into dry etching
- 9. Why plasmas?
- 10. Plasma system configurations
- 11. What is plasma etching?
- 12. Contact plasma etching
- 13. Remote plasma etching
- 14. High aspect ratio trench etching
- 15. Moulding of microstructures
- 16. Fabrication of movable microstructures.
by "Nielsen BookData"