Ion implantation technology : 16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France 11-16 June 2006
著者
書誌事項
Ion implantation technology : 16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France 11-16 June 2006
（AIP conference proceedings, v. 866）
American Institute of Physics, 2006
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注記
Incledes bibliographical references and index
内容説明・目次
内容説明
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
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