Design for manufacturability and yield for nano-scale CMOS
著者
書誌事項
Design for manufacturability and yield for nano-scale CMOS
（Series on Integrated Circuits and Systems）
Springer, c2007
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
目次
1. Introduction of DFM/DFY. a. What is DFM/DFY ? historical perspective. b. Why is it becoming ever so critical? c. DFM categories & classifications. d. How do various DFM solutions tie up with specific design flows. e. DFM & DFY are intertwined. 2. Random Defects. a. CAA. b. Improving CAA. c. Cell library yield grading based on CAA. 3. Systematic yield. a. Lithography. 4. Systematic yield. b. CMP 5. Parametric yield. a. Intro. b. Timing aspects. c. Power considerations. 6. Design for yield. a. analysis. b. prediction. c. enhancement. 7. Summary and Conclusions
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