Principles of chemical vapor deposition
著者
書誌事項
Principles of chemical vapor deposition
Kluwer Academic Publishers, c2003
大学図書館所蔵 全2件
  青森
  岩手
  宮城
  秋田
  山形
  福島
  茨城
  栃木
  群馬
  埼玉
  千葉
  東京
  神奈川
  新潟
  富山
  石川
  福井
  山梨
  長野
  岐阜
  静岡
  愛知
  三重
  滋賀
  京都
  大阪
  兵庫
  奈良
  和歌山
  鳥取
  島根
  岡山
  広島
  山口
  徳島
  香川
  愛媛
  高知
  福岡
  佐賀
  長崎
  熊本
  大分
  宮崎
  鹿児島
  沖縄
  韓国
  中国
  タイ
  イギリス
  ドイツ
  スイス
  フランス
  ベルギー
  オランダ
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  ノルウェー
  アメリカ
注記
Includes bibliographical references and index
内容説明・目次
内容説明
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.
This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
目次
Acknowledgements. Preface.
1: Introduction.
1. What's behind the facade? 2. Generic reactors and process considerations. 3. Tube and showerhead reactor examples.
2: Reactors without transport.
1. What goes in must go somewhere: Measuring gases. 2. Review: Kinetic theory. 3. The zero-dimensional reactor. 4. Zero-dimensional tube and showerhead examples.
3: Mass transport.
1. Introduction to transport. 2. Convection and diffusion. 3. Diffusion: Physics and math. 4. Fluid flow and convective transport. 5. When flows matter: The Knudsen number. 6. Tube and showerhead examples. 7. On to photons.
4: Heat transport.
1. What is heat (energy) transport? 2. Heat conduction and diffusion. 3. Convective heat transfer made (very) simple. 4. Natural convection. 5. Radiative heat transfer. 6. Temperature measurement. 7. Tube and showerhead examples.
5: Chemistry for CVD.
1. What does the C stand for anyway? 2. Volatility, the V in CVD. 3. Equilibrium: Where things are going. 4. Kinetics: The slowest step wins. 5. Real precursors for real films. 6. Tube reactor example. 7. A few final remarks.
6: Gas discharge plasmas for CVD.
1. Plasma discharges: An instant review. 2. The low-pressure cold-plasma state. 3. Key parameters for capacitive plasma state. 4. Alternative excitation methods. 5. Plasmas for deposition. 6. Plasma damage. 7. Technical details. 8. Ongoing example: Parallel plate reactor. 9. A remark on computational tools.
7: CVD films.
1. Why CVD? 2. Silicon dioxide. 3. Silicon nitride. 4. Tantalum pentoxide. 5. Metal deposition by CVD. 6. Concluding remarks.
8: CVD reactors.
1. CVD reactor configurations. 2. Tube reactors. 3. Showerhead reactors. 4. High density plasma reactors. 5. Injector-based atmospheric pressure reactors. 6. Reactor conclusions.
Index.
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