Microlithography : science and technology
著者
書誌事項
Microlithography : science and technology
(Optical science and engineering, 126)
CRC Press, Taylor & Francis Group, c2007
2nd ed.
- : alk. paper
大学図書館所蔵 全3件
  青森
  岩手
  宮城
  秋田
  山形
  福島
  茨城
  栃木
  群馬
  埼玉
  千葉
  東京
  神奈川
  新潟
  富山
  石川
  福井
  山梨
  長野
  岐阜
  静岡
  愛知
  三重
  滋賀
  京都
  大阪
  兵庫
  奈良
  和歌山
  鳥取
  島根
  岡山
  広島
  山口
  徳島
  香川
  愛媛
  高知
  福岡
  佐賀
  長崎
  熊本
  大分
  宮崎
  鹿児島
  沖縄
  韓国
  中国
  タイ
  イギリス
  ドイツ
  スイス
  フランス
  ベルギー
  オランダ
  スウェーデン
  ノルウェー
  アメリカ
注記
Includes bibliographical references and index
HTTP:URL=http://www.loc.gov/catdir/toc/ecip071/2006031516.html Information=Table of contents only
HTTP:URL=http://www.loc.gov/catdir/enhancements/fy0701/2006031516-d.html Information=Publisher description
内容説明・目次
内容説明
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.
New in the Second EditionIn addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:
Immersion Lithography
157nm Lithography
Electron Projection Lithography (EPL)
Extreme Ultraviolet (EUV) Lithography
Imprint Lithography
Photoresists for 193nm and Immersion Lithography
Scatterometry
Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.
Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
目次
EXPOSURE SYSTEM. System Overview of Optical Steppers and Scanners. Optical Lithography Modeling. Optics for Photolithography. Excimer Laser for Advanced Microlithography. Alignment and Overlay. Electron Beam Lithography System. X-Ray Lithography. EUV Lithography. Imprint Lithography. RESISTS AND PROCESSING. Chemistry of Photoresist Materials. Resist Processing. Multilayer Resist Technology. Dry Etching of Photoresists. METROLOGY AND NANOLITHOGRAPHY. Critical-Dimensional Metrology for Integrated-Circuit Technology. Electron Beam Nanolithography. Index.
「Nielsen BookData」 より