Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Author(s)

• Data Analysis and Modeling for Process Control (Conference)
• Tobin, Kenneth W.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

Bibliographic Information

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5378）

SPIE, c2004

Note

Includes bibliographical references and index

Details

• NCID: BA86005271
• ISBN:
  • 0819452912
• LCCN: 2004303114
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: xxx, 248 p.
• Size: 28 cm
• Classification:
  • LCC : TS183
  • DC22 : 660/.2815
• Subject Headings:
  • LCSH : Manufacturing processes -- Mathematical models -- Congresses
  • LCSH : Manufacturing processes -- Automatic control -- Congresses
  • LCSH : Intelligent control systems -- Mathematical models -- Congresses
  • LCSH : Process control -- Mathematical models -- Congresses
• Parent Bibliography ID:
  • BA0022700X