Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

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書誌事項

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5378）

SPIE, c2004

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注記

Includes bibliographical references and index

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内容説明

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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