Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

著者

• Data Analysis and Modeling for Process Control (Conference)
• Tobin, Kenneth W.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

書誌事項

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5378）

SPIE, c2004

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA86005271
• ISBN:
  • 0819452912
• LCCN: 2004303114
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: xxx, 248 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TS183
  • DC22 : 660/.2815
• 件名:
  • LCSH : Manufacturing processes -- Mathematical models -- Congresses
  • LCSH : Manufacturing processes -- Automatic control -- Congresses
  • LCSH : Intelligent control systems -- Mathematical models -- Congresses
  • LCSH : Process control -- Mathematical models -- Congresses
• 親書誌ID:
  • BA0022700X