Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

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書誌事項

Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5755）

SPIE, c2005

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注記

Includes bibliographical references and author index

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内容説明

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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