Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

Author(s)

• Design and Process Integration for Microelectronic Manufacturing (Conference)
• Starikov, Alexander
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

Alexander Starikov, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5042）

SPIE, c2003

Note

2002 conference proceedings titled: Design, process integration, and characterization for microelectronics

Includes bibliographical references and index

Details

• NCID: BA86007812
• ISBN:
  • 0819448478
• LCCN: 2004296398
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: viii, 418 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC22 : 621.381
• Subject Headings:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Defects -- Analysis -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Semiconductor wafers -- Defects -- Analysis -- Congresses
  • LCSH : Microelectronics industry -- Quality control -- Congresses
  • LCSH : Quality control -- Congresses
• Parent Bibliography ID:
  • BA0022700X