Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

Author(s)

• Design and Process Integration for Microelectronic Manufacturing (Conference)
• Liebmann, Lars W.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

Bibliographic Information

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5379）

SPIE, c2004

Other Title

Design and process integration for microelectronic manufacturing III

Note

2004 conference is the third conference in the series

Includes bibliographical references and index

Details

• NCID: BA86008098
• ISBN:
  • 0819452920
• LCCN: 2004303081
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: xxviii, 302 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC22 : 621.381
• Subject Headings:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Defects -- Analysis -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Semiconductor wafers -- Defects -- Analysis -- Congresses
  • LCSH : Microelectronics industry -- Quality control -- Congresses
  • LCSH : Quality control -- Congresses
• Parent Bibliography ID:
  • BA0022700X