Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA

Author(s)

• Design, Process Integration, and Characterization for Microelectronics (Conference)
• Starikov, Alexander
• Tobin, Kenneth W.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA

Alexander Starikov, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4692）

SPIE, c2002

Note

Includes bibliographical references and index

Details

• NCID: BA86010726
• ISBN:
  • 0819444391
• LCCN: 2002512515
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xv, 628 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
• Subject Headings:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Defects -- Analysis -- Congresses
  • LCSH : Semiconductors -- Characterization -- Congresses
  • LCSH : Semiconductor wafers -- Defects -- Analysis -- Congresses
  • LCSH : Microelectronics industry -- Quality control -- Congresses
  • LCSH : Quality control -- Congresses
• Parent Bibliography ID:
  • BA0022700X