Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA

Author(s)

• Dobisz, Elizabeth Ann
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

Bibliographic Information

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA

Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4343）

SPIE, c2001

Other Title

Emerging lithographic technologies 5

Emerging lithographic technologies five

Note

Includes bibliographical references and index

Details

• NCID: BA86033448
• ISBN:
  • 0819440299
• LCCN: 2001279005
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xv, 818 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : Microlithography -- Industrial applications -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : X-rays -- Industrial applications -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• Parent Bibliography ID:
  • BA0022700X