Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

著者

• Seeger, David E.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• SEMATECH (Organization)

書誌事項

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2723）

SPIE, c1996

注記

Includes bibliographic references and index

詳細情報

• NII書誌ID(NCID): BA86046905
• ISBN:
  • 0819420999
• LCCN: 95072312
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: vii, 412 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X