EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Author(s)

    • European Conference on Mask Technology for Integrated Circuits and Microcomponents
    • Behringer, Uwe F. W.
    • VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
    • Institut für Mikrostrukturtechnik
    • SEMI-Europe

Bibliographic Information

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany)

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5835）

SPIE , VDE Verlag GmbH, c2005

Other Title

European Mask and Lithography Conference

European Conference on Mask Technology for Integrated Circuits and Microcomponents

Mask and lithography

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Includes bibliographical references and author index

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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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