EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Author(s)

• European Conference on Mask Technology for Integrated Circuits and Microcomponents
• Behringer, Uwe F. W.
• VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
• Institut für Mikrostrukturtechnik
• SEMI-Europe
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany)

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5835）

SPIE , VDE Verlag GmbH, c2005

Other Title

European Mask and Lithography Conference

European Conference on Mask Technology for Integrated Circuits and Microcomponents

Mask and lithography

Note

Includes bibliographical references and author index

Details

• NCID: BA8605470X
• ISBN:
  • 0819458309
• LCCN: 2006273846
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.,,Berlin, Germany
• Pages/Volumes: xxx, 302 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X