Plasma processing : proceedings of the Symposium on Plasma Etching and Deposition

著者

• Symposium on Plasma Etching and Deposition (1980 : Hollywood, Fla.)
• Frieser, R. G.
• Mogab, C. J.
• Electrochemical Society. Dielectrics and Insulation Division
• Electrochemical Society. Electronics Division

書誌事項

Plasma processing : proceedings of the Symposium on Plasma Etching and Deposition

edited by R.G. Frieser, C.J. Mogab ; [sponsored by] Dielectrics and Insulation and Electronics Divisions

（Proceedings / [Electrochemical Society], v. 81-1）

Electrochemical Society, c1981

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA88926207
• LCCN: 81065237
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, NJ (10 South Main St., Pennington 08534)
• ページ数/冊数: x, 336 p.
• 大きさ: 23 cm
• 分類:
  • LCC : TK7871.85
  • DC19 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Plasma etching -- Congresses
• 親書誌ID:
  • BA01323290