Strained silicon heterostructures : materials and devices

著者

書誌事項

Strained silicon heterostructures : materials and devices

edited by C.K. Maiti, N.B. Chakrabarti and S.K. Ray

(IEE circuits, devices and systems series, 12)

Institution of Electrical Engineers, c2001

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

This book comprehensively covers the areas of materials growth, characterisation and descriptions for the new devices in siliconheterostructure material systems. In recent years, the development of powerful epitaxial growth techniques such as molecular beam epitaxy (MBE), ultra-high vacuum chemical vapour deposition (UHVCVD) and other low temperature epitaxy techniques has given rise to a new area of research of bandgap engineering in silicon-based materials. This has paved the way not only for heterojunction bipolar and field effect transistors, but also for other fascinating novel quantum devices. This book provides an excellent introduction and valuable references for postgraduate students and research scientists.

目次

Chapter 1: Introduction Chapter 2: Strained Layer Epitaxy Chapter 3: Electronic Properties of Alloy Layers Chapter 4: Gate Dielectrics on Strained Layers Chapter 5: SiGe Heterojunction Bipolar Transistors Chapter 6: Heterostructure Field Effect Transistors Chapter 7: BICFET, RTD and Other Devices Chapter 8: MODFETs Chapter 9: Contact Metallization on Strained Layers Chapter 10: Si/SiGe Optoelectronics

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詳細情報

  • NII書誌ID(NCID)
    BA89887676
  • ISBN
    • 0852967780
  • 出版国コード
    uk
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    London
  • ページ数/冊数
    xii, 496 p
  • 大きさ
    25cm
  • 分類
  • 件名
  • 親書誌ID
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