Handbook of plasma immersion ion implantation and deposition

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書誌事項

Handbook of plasma immersion ion implantation and deposition

edited by André Anders

Wiley-VCH, c2004

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.

目次

Introduction (J. Conrad). FUNDAMENTALS. Fundamentals of Plasmas and Sheaths (M. Lieberman). Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.). Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.). Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.). TECHNOLOGY. Design of a PIII&D Processing Chamber (J. Matossian, et al.). Plasma Sources (A. Anders, et al.). Pulser Technology (D. Goebel, et al.). Health and Safety Issues Related to PIII&D (D. Beals, et al.). APPLICATIONS. Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.). Semiconductor Applications (P. Chu, et al.). Appendices. Index.

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