{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BB01271503.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BB01271503#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BB01271503.json"},"dc:title":[{"@value":"Proceedings of the Eighth International Conference on Chemical Vapor Deposition 1981"}],"dc:creator":"edited by John M. Blocher, Jr. ... [et al.]","dc:publisher":[{"@value":"Electorochemical Society"}],"dcterms:extent":"xv, 820 p.","cinii:size":"23 cm","dc:language":"eng","dc:date":"1981","cinii:ncid":"BB01271503","cinii:ownerCount":"2","foaf:maker":[{"@id":"https://ci.nii.ac.jp/author/DA02096871#entity","@type":"foaf:Person","foaf:name":[{"@value":"International Conference on Chemical Vapor Deposition"}]},{"@type":"foaf:Person","foaf:name":[{"@value":"Blocher, John M"}]}],"bibo:owner":[{"@id":"https://ci.nii.ac.jp/library/FA001492","@type":"foaf:Organization","foaf:name":"東北大学 電気通信研究所 図書室","rdfs:seeAlso":{"@id":"http://opac.library.tohoku.ac.jp/opac/opac_openurl/?ncid=BB01271503"}},{"@id":"https://ci.nii.ac.jp/library/FA000106","@type":"foaf:Organization","foaf:name":"東京科学大学 大岡山図書館","rdfs:seeAlso":{"@id":"https://topics.libra.titech.ac.jp/recordID/catalog.bib/BB01271503"}}],"prism:publicationDate":["c1981"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Vapor-plating+--+Congresses","dc:title":"Vapor-plating -- Congresses"}],"dcterms:isPartOf":[{"@id":"https://ci.nii.ac.jp/ncid/BA01323290#entity","dc:title":"Proceedings / [Electrochemical Society], v. 81-7","@type":"bibo:Book"}]}]}