Fundamentals and applied aspects

著者

    • Kohli, Rajiv
    • Mittal, K. L.

書誌事項

Fundamentals and applied aspects

edited by Rajiv Kohli and K.L. Mittal

（Developments in surface contamination and cleaning）

W. Andrew, c2008

大学図書館所蔵 件 / 全3件

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are okiller defectsoe today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.

目次

Introduction Part 1: Fundamentals The Physical Nature of Very, Very Small Particles and its Impact on their Behavior Elucidating the Nature of Very Small Particles Transport and Deposition of Aerosol Particles Relevance of Particle Transport in Surface Deposition and Cleaning Tribological Implications of Particles Airborne Molecular Contamination Engineering Aspects of Particle Adhesion and Removal ESD Controls in Cleanroom Environments: Relevance to Particle Deposition Part 2: Characterization of Surface Contaminants Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles Surface Analysis Methods for Contaminant Identification Ionic Contamination and Analytical Techniques for Ionic Contamination Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants Wettability Techniques to Monitor the Cleanliness of Surfaces Part 3: Methods for Removal of Surface Contamination The Use of Surfactants to Enhance Particle Removal from Surfaces Cleaning with Solvents Removal of Particles by Chemical Cleaning Cleaning Using High-Speed Impinging Jet Microabrasive Precision Cleaning and Processing Technology Precision Cleaning Using Microdroplet Beams Cleaning Using Argon/Nitrogen Cryogenic Aerosols Carbon Dioxide Snow Cleaning Coatings for Preventing or Deactivation of Biological Contaminants Detailed Study of Semiconductor Wafer Drying

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