{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BB07007869.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BB07007869#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BB07007869.json"},"dc:title":[{"@value":"Delta-doping of semiconductors"}],"dc:creator":"edited by E.F. Schubert","dc:publisher":[{"@value":"Cambridge University Press"}],"dcterms:extent":"xii, 604 p.","cinii:size":"25 cm","dc:language":"eng","dc:date":"2005","cinii:ncid":"BB07007869","cinii:ownerCount":"0","foaf:maker":[{"@id":"https://ci.nii.ac.jp/author/DA07665282#entity","@type":"foaf:Person","foaf:name":[{"@value":"Schubert, E. Fred"}]}],"prism:publicationDate":["2005"],"cinii:note":["Originally published: 1996","\"This digitally printed first paperback version 2005\"--T.p. verso","\"Paperback re-issue\"--Back cover","Includes bibliographical references and index"],"dc:subject":["LCC:TK7871.85","DC20:621.3815/2"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Semiconductors+--+Design+and+construction","dc:title":"Semiconductors -- Design and construction"},{"@id":"https://ci.nii.ac.jp/books/search?q=Semiconductor+doping","dc:title":"Semiconductor doping"},{"@id":"https://ci.nii.ac.jp/books/search?q=Molecular+beam+epitaxy","dc:title":"Molecular beam epitaxy"},{"@id":"https://ci.nii.ac.jp/books/search?q=Field+effect+transistors","dc:title":"Field effect transistors"}],"dcterms:hasPart":[{"@id":"urn:isbn:9780521017961","dc:title":": pbk"}]}]}