Characterization of optical materials
著者
書誌事項
Characterization of optical materials
（Materials characterization series : surfaces, interfaces, thin films / series editors, C. Richard Brundle, Charles A. Evans, Jr.）
Momentum Press, 2010
- : hbk. : case bound
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注記
Originally published: Butterworth-Heinemann, 1993
Includes bibliographical references and index
内容説明・目次
内容説明
Optical materials are prized for their properties such as reflection, refraction, absorption, emission, scattering, and diffraction of light in wavelengths ranging from 100 nm to 10 mm. Because small surface or atomic structure defects can have significant affects on those properties, characterization techniques that are sensitive to structures at those scales are presented for the relative effectiveness and particular applications. Readers will find:
A review of surface roughness as it relates to desired optical propertiesCharacterization of optical materials used for III-V semiconductor systems, group IV materials, and amorphous and microcrystalline semiconductorsCoverage of on the stability and modification of film and surface optical properties, including optical coatings, optical films, and laser-induced damage to optical materialsConcise summaries of major characterization technologies for integrated circuit packaging materials, including acoustic microscopy, atomic absorption spectrometry, Auger Electron Spectroscopy, Energy-Dispersive X-Ray Spectroscopy, and many more
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