Advances in CMP/polishing technologies for the manufacture of electronic devices

Bibliographic Information

Advances in CMP/polishing technologies for the manufacture of electronic devices

edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa

William Andrew : Elsevier, 2012

  • : hbk

Other Title

Advances in CMP polishing technologies

CMP polishing technologies for the manufacture of electronic devices : advances in

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On title page: "William Andrew is an imprint of Elsevier"

Includes bibliographical references and index

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