Advances in CMP/polishing technologies for the manufacture of electronic devices
Author(s)
Bibliographic Information
Advances in CMP/polishing technologies for the manufacture of electronic devices
William Andrew : Elsevier, 2012
- : hbk
- Other Title
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Advances in CMP polishing technologies
CMP polishing technologies for the manufacture of electronic devices : advances in
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Note
On title page: "William Andrew is an imprint of Elsevier"
Includes bibliographical references and index
Description and Table of Contents
Description
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community.
Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience.
Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.
Table of Contents
Chapter 1: Introduction
Chapter 2: Device fabrication with a silicon crystal substrate
Chapter 3: Ultra-precision technology - taking silicon single crystal as an example
Chapter 4: Applications of ultra-precision CMP in device processes
Chapter 5: The future of processing technology
Chapter 6: Progress of the semiconductor and silicon industries
Chapter 7: Summary
by "Nielsen BookData"
