Handbook of thin film deposition : techniques, processes, and technologies

著者

    • Seshan, Krishna

書誌事項

Handbook of thin film deposition : techniques, processes, and technologies

edited by Krishna Seshan

William Andrew , Elsevier [distributor], c2012

3rd ed

大学図書館所蔵 件 / 全6件

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

目次

Foreword to the Third Edition Scaling of Devices and Thermal Scaling PVD - Special Topics CVD New Developments CVD Equipment CMP Method and Practice Process Technology for Copper Interconnects Optical Thin Films Thin Films in Photovoltaics Thin Films in Memory Applications Index

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