Contaminant removal and monitoring
著者
書誌事項
Contaminant removal and monitoring
（Developments in surface contamination and cleaning, v. 5）
W. Andrew, 2013
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.
This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.
目次
Surface Contamination Removal Using Dense Phase Fluids: Liquid and Supercritical Carbon Dioxide
Plasma Cleaning for Electronic, Photonic, Biological and Archeological Applications
Cleanroom Wipers for Removal of Surface Contamination
Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing
Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale
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